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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Improving 3D resist profile compact modeling by exploiting 3D resist physical mechanisms

Lai, Kafai, Erdmann, Andreas, Fan, Yongfa, Wu, Cheng-En R., Ren, Qian, Song, Hua, Schmoeller, Thomas

Année:

2014

Langue:

english

Fichier:

PDF, 415 KB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Lai, Kafai, Erdmann, Andreas, Gao, Weimin, Klostermann, Ulrich, Kamohara, Itaru, Schmoeller, Thomas, Lucas, Kevin, Demmerle, Wolfgang, De Bisschop, Peter, Mailfert, Julien

Année:

2014

Langue:

english

Fichier:

PDF, 960 KB

english, 2014

3

Rigorous assessment of patterning solution of metal layer in 7 nm technology node

Gao, Weimin, Ciofi, Ivan, Saad, Yves, Matagne, Philippe, Bachmann, Michael, Gillijns, Werner, Lucas, Kevin, Demmerle, Wolfgang, Schmoeller, Thomas

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2016

Langue:

english

Fichier:

PDF, 6.03 MB

english, 2016

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Application of an inverse Mack model for negative tone development simulation

Gao, Weimin, Klostermann, Ulrich, Mülders, Thomas, Schmoeller, Thomas, Demmerle, Wolfgang, De Bisschop, Peter, Bekaert, Joost

Année:

2011

Langue:

english

Fichier:

PDF, 2.20 MB

english, 2011

5

No princípio era o verbo: a cultura escolar e o ensino da língua vernácula no ensino secundário brasileiro (1759-1960)

Schmoeller, Luci, Dallabrida, Norberto

Journal:

Working Papers em Lingüística

Année:

2017

Fichier:

PDF, 352 KB

2017

6

Building bulk-resist model for image formation in chemically amplified resists at EUV

Piyush Pathak, Qiliang Yan, Thomas Schmoeller, Ebo Croffie, Lawrence S. Melvin III

Journal:

Microelectronic Engineering

Année:

2009

Langue:

english

Fichier:

PDF, 754 KB

english, 2009

7

2.5 YEARS OF AMNOG IN GERMANY – AN ANALYSIS OF BENEFIT ASSESSMENT AND NET PRICE NEGOTIATION TRENDS

Dehnen, J., Schmoeller, M.

Journal:

Value in Health

Année:

2013

Langue:

english

Fichier:

PDF, 73 KB

english, 2013

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations

Lai, Kafai, Erdmann, Andreas, Gao, Weimin, Ciofi, Ivan, Saad, Yves, Matagne, Philippe, Bachmann, Michael, Oulmane, Mohamed, Gillijns, Werner, Lucas, Kevin, Demmerle, Wolfgang, Schmoeller, Thomas

Année:

2015

Langue:

english

Fichier:

PDF, 1003 KB

english, 2015

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - 3D resist profile modeling for OPC applications

Fan, Yongfa, Conley, Will, Koh, Kar Kit, Yang, Qing, Hoppe, Wolfgang, Kuechler, Bernd, Perampalam, Puvan, Miyagi, Makoto, Zavyalova, Lena, Schmoeller, Thomas

Année:

2013

Langue:

english

Fichier:

PDF, 666 KB

english, 2013

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Shadowing effect modeling and compensation for EUV lithography

Song, Hua, La Fontaine, Bruno M., Naulleau, Patrick P., Zavyalova, Lena, Su, Irene, Shiely, James, Schmoeller, Thomas

Année:

2011

Langue:

english

Fichier:

PDF, 357 KB

english, 2011

11

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Three dimensional mask effects in OPC process model development from first principles simulation

Melvin III, Lawrence S., Schmoeller, Thomas, Kalus, Christian K., Li, Jianliang

Année:

2008

Langue:

english

Fichier:

PDF, 303 KB

english, 2008

12

Modular robot used as a beach cleaner

Schmoeller da Roza, Felippe, Ghizoni da Silva, Vinicius, Pereira, Patrick Jose, Wildgrube Bertol, Douglas

Journal:

Ingeniare Revista chilena de ingeniería

Année:

2016

Langue:

english

Fichier:

PDF, 1.59 MB

english, 2016

13

Catechols in caffeic acid phenethyl ester are essential for inhibition of TNF-mediated IP-10 expression through NF-κB-dependent but HO-1- and p38-independent mechanisms in mouse intestinal epithelial cells

Job O. Mapesa, Nadine Waldschmitt, Ingrid Schmoeller, Carolin Blume, Thomas Hofmann, Symon Mahungu, Thomas Clavel, Dirk Haller

Journal:

Molecular Nutrition & Food Research

Année:

2011

Langue:

english

Fichier:

PDF, 335 KB

english, 2011

14

Modelling strategies for the incorporation and correction of optical effects in EUVL

Piyush Pathak, Qiliang Yan, Thomas Schmoeller, Ebo Croffie, Artak Isoyan, Lawrence S. Melvin III

Journal:

Microelectronic Engineering

Année:

2009

Langue:

english

Fichier:

PDF, 855 KB

english, 2009

15

Scleromyxedema with monoclonal gammopathy and neurological involvement: recovery from coma after plasmapheresis?

Aline Defaveri do Prado, Deonilson Schmoeller, Melissa Cláudia Bisi, Deise Marcela Piovesan, Fernando S. Dias, Henrique Luiz Staub

Journal:

International Journal of Dermatology

Année:

2012

Langue:

english

Fichier:

PDF, 102 KB

english, 2012

16

Indications for Directed Thrombolysis or New Bypass in Treatment of Occlusion of Lower Extremity Arterial Bypass Reconstruction

Thomas Schwierz, Manfred Gschwendtner, Wolfgang Havlicek, Friedrich Schmoeller, Hans Joerg Boehmig, Reinhold Függer

Journal:

Annals of Vascular Surgery

Année:

2001

Langue:

english

Fichier:

PDF, 421 KB

english, 2001

17

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Integrated mask and optics simulations for mask corner rounding effect in OPC modeling

Xue, Jing, Deng, Zhijie, Koo, Kyoil, Shiely, James, Lee, Sooryong, Zhang, Yunqiang, Fan, Yongfa, Schmoeller, Thomas, Montgomery, M. Warren, Maurer, Wilhelm

Année:

2010

Langue:

english

Fichier:

PDF, 5.18 MB

english, 2010

18

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Accuracy of new analytical models for resist formation lithography

Malov, Juriy, Kalus, Christian K., Muellerke, Henning, Schmoeller, Thomas, Wildfeuer, Robert, Yen, Anthony

Année:

2002

Langue:

english

Fichier:

PDF, 826 KB

english, 2002

19

Psychiatric symptoms in patients with systemic lupus erythematosus: frequency and association with disease activity using the Adult Psychiatric Morbidity Questionnaire

da Rosa Beltrão, Sônia Maria, Gigante, Luciana Beltrão, Zimmer, Débora Beltrão, Zimmermann, Paulo Roberto, Schmoeller, Deonilson, Batistella, Fábio, Staub, Henrique Luiz

Journal:

Revista Brasileira de Reumatologia

Année:

2013

Fichier:

PDF, 229 KB

2013

20

Sa1739 Comparative Proteome Profiling of Intestinal Epithelial Cells in Mice and IBD Patients

Hahne, Hannes, Schmoeller, Ingrid R., Sans, Miquel, Vetrano, Stefania, Sala, Emanuela, Danese, Silvio, Kuster, Bernhard, Haller, Dirk

Journal:

Gastroenterology

Année:

2014

Langue:

english

Fichier:

PDF, 189 KB

english, 2014

21

Sintomas psiquiátricos em pacientes com lúpus eritematoso sistêmico: frequência e associação com atividade da doença com o uso do Questionário de Morbidade Psiquiátrica em Adultos

da Rosa Beltrão, Sônia Maria, Beltrão Gigante, Luciana, Beltrão Zimmer, Débora, Roberto Zimmermann, Paulo, Schmoeller, Deonilson, Batistella, Fábio, Luiz Staub, Henrique

Journal:

Revista Brasileira de Reumatologia

Année:

2013

Fichier:

PDF, 262 KB

2013

22

The discourse of ethics in nursing education: Experience and reflections of Brazilian teachers – Case study

Ramos, Flávia Regina Souza, de Pires, Denise Elvira Pires, Brehmer, Laura Cavalcanti de Farias, Gelbcke, Francine Lima, Schmoeller, Soraia Dornelles, Lorenzetti, Jorge

Journal:

Nurse Education Today

Année:

2013

Langue:

english

Fichier:

PDF, 178 KB

english, 2013

23

Hepatosplenic gammadelta T-cell lymphoma and Sjögren's syndrome

Godinho, Ronaldo, de Oliveira, Paula Vanessa, Schmoeller, Deonilson Ghizoni, Staub, Henrique L.

Journal:

Reumatología Clínica

Année:

2014

Langue:

english

Fichier:

PDF, 224 KB

english, 2014

24

Psychiatric Disorders and Health-Related Quality of Life after Severe Traumatic Brain Injury: A Prospective Study

Diaz, Alexandre Paim, Schwarzbold, Marcelo Liborio, Thais, Maria Emilia, Hohl, Alexandre, Bertotti, Melina More, Schmoeller, Roseli, Nunes, Jean Costa, Prediger, Rui, Linhares, Marcelo Neves, Guarnier

Journal:

Journal of Neurotrauma

Année:

2012

Langue:

english

Fichier:

PDF, 222 KB

english, 2012

25

Limited predictive power of hospitalization variables for long-term cognitive prognosis in adult patients with severe traumatic brain injury

de Oliveira Thais, Maria Emília Rodrigues, Cavallazzi, Gisele, Formolo, Douglas Afonso, de Castro, Lucas D'Ávila, Schmoeller, Roseli, Guarnieri, Ricardo, Schwarzbold, Marcelo Liborio, Diaz, Alexandre

Journal:

Journal of Neuropsychology

Année:

2014

Langue:

english

Fichier:

PDF, 197 KB

english, 2014

26

Pneumococcal arthroentesitis and multiple myeloma

Pinto, Ana Paula de Oliveira, da Silva, Bárbara Mendes, Scarton, Anna Libera da Costa Beber, Schmoeller, Deonilson Ghizoni, Staub, Henrique Luiz

Journal:

Rheumatology International

Année:

2015

Langue:

english

Fichier:

PDF, 149 KB

english, 2015

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Analysis of topography effects on lithographic performance in double patterning applications

Siebert, J., Brooker, P., Schmoeller, T., Klimpel, T., Levinson, Harry J., Dusa, Mircea V.

Année:

2009

Langue:

english

Fichier:

PDF, 412 KB

english, 2009

28

Linking Brazil’s food security policies to agricultural change

Oldekop, Johan A., Chappell, M. Jahi, Peixoto, Felipe E. Borges, Paglia, Adriano Pereira, do Prado Rodrigues, Marina Schmoeller, Evans, Karl L.

Journal:

Année:

2015

Langue:

english

Fichier:

PDF, 1.09 MB

english, 2015

29

Cocaine abuse, retiform purpura and antiphospholipid syndrome

Schmoeller, Deonilson Ghizoni, Silva, Barbara Mendes da, Staub, Henrique Luiz

Journal:

Année:

2015

Langue:

english

Fichier:

PDF, 44 KB

english, 2015

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Combining lithography and etch models in OPC modeling

Lai, Kafai, Erdmann, Andreas, Zavyalova, Lena V., Luan, Lan, Song, Hua, Schmoeller, Thomas, Shiely, James P.

Année:

2014

Langue:

english

Fichier:

PDF, 866 KB

english, 2014

31

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Polarization-dependent proximity effects

Tyminski, Jacek K., Matsuyama, Tomoyuki, Nakashima, Toshiharu, Schmoeller, Thomas, Lewellen, John, Flagello, Donis G.

Année:

2007

Langue:

english

Fichier:

PDF, 313 KB

english, 2007

32

[IEEE 2015 IEEE 18th International Conference on Intelligent Transportation Systems - (ITSC 2015) - Gran Canaria, Spain (2015.9.15-2015.9.18)] 2015 IEEE 18th International Conference on Intelligent Transportation Systems - Identifying Users and Use of (Electric-) Free-Floating Carsharing in Berlin and Munich

Mueller, Johannes, Schmoeller, Stefan, Giesel, Flemming

Année:

2015

Langue:

english

Fichier:

PDF, 667 KB

english, 2015

33

Hepatosplenic gammadelta T-cell lymphoma and Sjögren's syndrome

Godinho, Ronaldo, de Oliveira, Paula Vanessa, Schmoeller, Deonilson Ghizoni, Staub, Henrique L.

Journal:

Reumatología Clínica

Année:

2014

Langue:

english

Fichier:

PDF, 177 KB

english, 2014

34

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Rigorous simulation of defective EUV multilayer masks

Sambale, Christoph, Schmoeller, Thomas, Erdmann, Andreas, Evanschitzky, Peter, Kalus, Christian K., Kimmel, Kurt R., Staud, Wolfgang

Année:

2003

Langue:

english

Fichier:

PDF, 1.10 MB

english, 2003

35

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Rigorous simulation of exposure over nonplanar wafers

Erdmann, Andreas, Kalus, Christian K., Schmoeller, Thomas, Klyonova, Yewgenija, Sato, Takashi, Endo, Ayako, Shibata, Tsuyoshi, Kobayashi, Yuuji, Yen, Anthony

Année:

2003

Langue:

english

Fichier:

PDF, 695 KB

english, 2003

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Comparative study of resolution limits for double patterning and EUV processes for the 32nm contact hole case

Kamohara, Itaru, Dusa, Mircea V., Conley, Will, Tajima, Keiichi, Schmoeller, Thomas

Année:

2010

Langue:

english

Fichier:

PDF, 7.85 MB

english, 2010

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - EUV pattern shift compensation strategies

Schmoeller, T., Schellenberg, Frank M., Klimpel, T., Kim, I., Lorusso, G. F., Myers, A., Jonckheere, R., Goethals, A. M., Ronse, K.

Année:

2008

Langue:

english

Fichier:

PDF, 3.51 MB

english, 2008

38

Yellow Fever Vaccination and Kawasaki Disease

Schmöeller, Deonilson, Keiserman, Mauro W., Staub, Henrique Luiz, Velho, Flávio Petersen, de Fátima Grohe, Marily

Journal:

Pediatric Infectious Disease Journal

Année:

2009

Langue:

english

Fichier:

PDF, 88 KB

english, 2009

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Layout optimization of DRAM cells using rigorous simulation model for NTD

Sturtevant, John L., Capodieci, Luigi, Jeon, Jinhyuck, Kim, Shinyoung, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Kuechler, Bernd, Zimmermann, Rainer, Muelders, Thomas, Klostermann, Ulrich, Schmoeller,

Année:

2014

Langue:

english

Fichier:

PDF, 1.34 MB

english, 2014

40

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Impact of mask pellicle effects to OPC quality

Koop, Hans, Watanabe, Hidehiro, Schmoeller, Thomas, Cheng, Wen-Hao

Année:

2007

Langue:

english

Fichier:

PDF, 706 KB

english, 2007

41

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - The impact of mask design on EUV imaging

Schmoeller, Thomas, Hosono, Kunihiro, Tyminski, Jacek K., Lewellen, John, Demmerle, Wolfgang

Année:

2009

Langue:

english

Fichier:

PDF, 1.02 MB

english, 2009

42

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques

Erdmann, Andreas, Kalus, Christian K., Schmoeller, Thomas, Wolter, Andreas, Engelstad, Roxann L.

Année:

2003

Langue:

english

Fichier:

PDF, 1.01 MB

english, 2003

43

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - 32nm half pitch node OPC process model development for three dimensional mask effects using rigorous simulation

Melvin III, Lawrence S., Naber, Robert J., Kawahira, Hiroichi, Schmoeller, Thomas, Li, Jianliang

Année:

2007

Langue:

english

Fichier:

PDF, 170 KB

english, 2007

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - A simplified reaction-diffusion system of chemically amplified resist process modeling for OPC

Fan, Yongfa, Dusa, Mircea V., Conley, Will, Jeongb, Moon-Gyu, Ser, Junghoon, Lee, Sung-Woo, Suh, Chunsuk, Koo, Kyo-Il, Lee, Sooryong, Su, Irene, Zavyalova, Lena, Falch, Brad, Huang, Jason, Schmoeller,

Année:

2010

Langue:

english

Fichier:

PDF, 2.92 MB

english, 2010

45

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - OPC verification on cell level using fully rigorous mask topography simulation

Domnenko, Vitaly, Naber, Robert J., Kawahira, Hiroichi, Klimpel, Thomas, Viehoever, Georg, Koop, Hans, Melvin III, Lawrence S., Schmoeller, Thomas

Année:

2007

Langue:

english

Fichier:

PDF, 328 KB

english, 2007

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Split, overlap/stitching, and process design for double patterning considering local reflectivity variation by using rigorous 3D wafer-topography/lithography simulation

Kamohara, Itaru, Levinson, Harry J., Dusa, Mircea V., Schmoeller, Thomas

Année:

2009

Langue:

english

Fichier:

PDF, 3.70 MB

english, 2009

47

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Modification of boundaries conditions in the FDTD algorithm for EUV mask modeling

Vial, Alexandre, Erdmann, Andreas, Schmoeller, Thomas, Kalus, Christian K., Kawahira, Hiroichi

Année:

2002

Langue:

english

Fichier:

PDF, 211 KB

english, 2002

48

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Investigation of mask defectivity in full field EUV lithography

Jonckheere, Rik, Naber, Robert J., Kawahira, Hiroichi, Iwamoto, Fumio, Lorusso, G. F., Goethals, A. M., Ronse, K., Koop, H., Schmoeller, T.

Année:

2007

Langue:

english

Fichier:

PDF, 791 KB

english, 2007

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Analysis of EUVL mask effects under partially coherent illumination

Domnenko, Vitaly, Schellenberg, Frank M., La Fontaine, Bruno M., Schmoeller, Thomas, Klimpel, Thomas

Année:

2009

Langue:

english

Fichier:

PDF, 456 KB

english, 2009

50

Quantitative Assessment of Ophthalmologist Prescribing Patterns for Severe Vernal Keratoconjunctivitis (VKC) To Inform Payer Decision Making In The Eu

Schmoeller, M, Ernst, F, Gee, A, Hooten, J

Journal:

Value in Health

Année:

2017

Langue:

english

Fichier:

PDF, 59 KB

english, 2017